| Authors | Title | Abstract |
|---|
| N. B. Anikin, S. M. Starikovskaia, A. Yu. Starikovskii | Slow Oxidation of n-Hexane in Stoichiometric Mixtures with Air and Oxygen under Nanosecond Discharge Condition | Show |
| Th. Arnold, S. Grabovski, A. Schindler, H.-E. Wagner | Spatially Resolved Spectroscopic Investigations and Numerical Simulation of the Chemical Kinetics in Reactive Microwave Driven Plasma Jets | Show |
| C. Biloiu, I. A. Biloiu, A. Ohta, Y. Sakai, Y. Suda | Amorphous fluorocarbon polymer (a-C:F) films prepared in perfluorooctane (C8F18) vapor RF plasmas | Show |
| S. A. Bozhenkov, S. M. Starikovskaia, A. Yu. Starikovskii | Development of a Nanosecond Discharge at High Temperatures | Show |
| M. Geigl, H.-E. Wagner, V. Krutilina, J. Meichsner | Stable and Transient Neutral Species in RF CF4 Plasmas | Show |
| S. H. Haji Hosseini, N. A. Vahabzadeh, A. H. Sari, M. R. Hantehzadeh, M. Ghoranneviss | Investigation of Zn Diffusion in InGaAsP/InP Heterostructure Using Secondary Ion Mass Spectrometry | Show |
| T. Ishijima, H. Matoba, H. Sugai | Surface Wave Excited Plasma for Low-Temperature Silicon Oxidation and Oxygen Radical Control | Show |
| J. Kim, M. Katsurai | Optimum Plasma Generation for High-Quality Diamond Film Depositions in Surface Wave Plasma CVD Apparatus | Show |
| K. V. Korytchenko, M. A. Krasnogolovets, A. N. Dovbnya, Yu. Ya. Volkolupov | Variants of Applying Plasma-Wave Systems in Air-Jet Engines and Chemical Lasers | Show |
| S. Kurita, M. Yamashita, K. Naito, M. Nagatsu | Growth of Catalytic Metal Composed Amorphous Carbon Films and Carbon Nanotube Using Large-Area Surface-Wave Plasma | Show |
| K. Kutasi, Z. Donko, L. Nemes, M. Mohai | Optical Emission Spectroscopy of a Nitrogen Glow Discharge with Graphite Electrodes | Show |
| E. S. Lee, H. I. Park, H. K. Baik | Adhesion Enhancement of NCHF Rubber with the Polyurethane Coating Layer Using Atmospheric Air Plasma | Show |
| K. Li, O. Gabriel, J. Meichsner | Temporal Behaviour of CF2 Concentration in CF4/H2 Plasma of Pulsed RF Capacitive Discharge Studied by IR Diode Laser Spectroscopy | Show |
| A. I. Lyapin | Modelling of Processes Accompanying a Treatment of Surfaces in Gas Discharge: Influence of Discharge Regime on Working Gas Composition | Show |
| J. Maeda, T. Nakagawa, M. Nagatsu | Microwave Plasma CVD Reactor for Diamond Film Synthesis with Double Microwave Launchers System | Show |
| A. McCarter, R. N. Faulkner, A. R. Ellingboe, M. M. Turner | E to H Transition in Inductively Coupled Plasmas | Show |
| T. Mikoviny, S. Matejcik, B. Gulejova, C. Gaman, S. Eden, N. J. Mason, J. D. Skalny | Inhibition Effect of N2O on Generation Ozone by Negative Corona Discharge in Oxygen and Air | Show |
| T. Misu, M. Goto, T. Arai | Reactive Ion Etching of Diamond Films Using O2/CF4 Plasma with Narrow Electrode Gap | Show |
| G. Musa, I. Mustata, M. Blideran, V. Ciupina, R. Vladoiu, G. Prodan, E. Vasile, H. Ehrich | Carbon Thin Film Condensation from Thermionic Vacuum Arc Carbon Plasma | Show |
| S. Mändl, D. Manova, H. Neumann, B. Rauschenbach | Textured Film Deposition Using Metal Ions from a Plasma | Show |
| T. Ohta, T. Ishida, M. Hori, T. Goto, M. Ito, S. Kawakami, N. Ishii | The Behaviour of Si Atoms in Capacitively Coupled VHF Plasma Employing SiF4 | Show |
| J. Pawlat, N. Hayashi, C. Yamabe, A. Mizuno, I. Pollo | Tube Type Foaming Reactor Oxidants' Generation and Application Possibilities | Show |
| M. V. V. S. Rao, S. P. Sharma, B. A. Cruden, A. A. Bolshakov, M. Meyyappan | Study of Transition in Operating Region in Low-Pressure Inductively Coupled Oxygen Plasmas | Show |
| M. El Shaer, M. Wuttmann | Enhancement of Chlorides Removal from Copper Artifacts by the Effect of RF Hydrogen Plasma | Show |
| S. P. Sharma, B. A. Cruden, M. V. V. S. Rao, A. A. Bolshakov | Analysis of Emission Data from O2 Plasmas Used for Microbe Sterilization | Show |
| S. N. Srivastava, K. P. Rohr | Segregation of Neutrals and Ions in Laser Ablated Plasmas from Binary Targets | Show |
| S. N. Srivastava, K. P. Rohr | Energy and Emission Distributions of Ions in Laser Ablated Plasmas from Binary Targets | Show |
| H. Steffen, M. Quaas, H. Wulff, R. Hippler | On the Role of Negative Oxygen Ions during ITO Film Formation | Show |
| O. Stepanovic, J. Berndt, J. Winter | Synergistic Effects in Deposition and Etching of a-C:H-Films | Show |
| P. Svarnas, N. Spyrou, B. Held | Estimation of the Surface Free Energy of Polystyrene Thin Films Treated under a DC Point-to-Plane at Low-Pressure Discharge in Nitrogen | Show |
| K. Teranishi, S. Suzuki, H. Itoh | High Efficiency Ozone Production by a Compact Ozoniser Using Piezoelectric Transformer | Show |
| P. Vasina, L. De Poucques, O. Leroy, D. Pagnon, L. Teule-Gay, C. Boisse-Laporte, M. Touzeau | Optical Emission and Absorption Spectroscopy Measurements in a Microwave Assisted IPVD Reactor | Show |
& 